000 | 10696nam a2202017 i 4500 | ||
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001 | 7753056 | ||
003 | IEEE | ||
005 | 20230927112359.0 | ||
006 | m o d | ||
007 | cr |n||||||||| | ||
008 | 170118s2016 njua ob 001 eng d | ||
010 | _z 2007001281 (print) | ||
015 | _zGBA6A5950 (print) | ||
016 | _z013629291 (print) | ||
020 |
_a9781119069225 _qelectronic |
||
020 |
_z9781119069119 _qprint |
||
020 |
_z9780470081464 _qPaper |
||
020 |
_z0470081465 _qPaper |
||
024 | 7 |
_a10.1002/9781119069225 _2doi |
|
035 | _a(CaBNVSL)mat07753056 | ||
035 | _a(IDAMS)0b0000648585c6cb | ||
040 |
_aCaBNVSL _beng _erda _cCaBNVSL _dCaBNVSL |
||
082 | 0 | 0 | _a621.381 |
111 | 2 |
_aFTM-5 _d(2006 : _cCrete, Greece) |
|
245 | 1 | 0 |
_aFuture trends in microelectronics : _bup the nano creek / _cedited by Serge Luryi, Jimmy Xu, Alex Zaslavsky. |
264 | 1 |
_aHoboken, New Jersey : _bWiley-Interscience, _cc2007. |
|
264 | 2 |
_a[Piscataqay, New Jersey] : _bIEEE Xplore, _c[2016] |
|
300 |
_a1 PDF (xiv, 459 pages) : _billustrations. |
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336 |
_atext _2rdacontent |
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337 |
_aelectronic _2isbdmedia |
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338 |
_aonline resource _2rdacarrier |
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500 | _a"This book is a brainchild of the fifth workshop in the Future Trends in Microelectronics series (FTM-5) ... on Crete, Greece, in June of 2006"--Pref. | ||
504 | _aIncludes bibliographical references and index. | ||
505 | 0 | _aPreface / S. Luryi, J. M. Xu, and A. Zaslavsky ix -- I FUTURE OF DIGITAL SILICON 1 -- Prospects of Future Si Technologies in the Data-Driven World 4 / K. Kim and G. Jeong -- How Lithography Enables Moore's Law 21 / J. P. H. Benschop -- What Happened to Post-CMOS? 31 / P. M. Solomon -- Three-Dimensional Integration of Ge and Two-Dimensional: Materials for One-Dimensional Devices 46 / M. �Ostling, E. Dentoni Litta, and P.-E. Hellstr�om -- Challenges to Ultra-Low-Power Semiconductor Device Operation 62 / F. Balestra -- A Universal Nonvolatile Processing Environment 74 / T. Windbacher, A. Makarov, V. Sverdlov, and S. Selberherr -- Can MRAM (Finally) Be a Factor? 82 / J.-P. Nozi�eres -- Nanomanufacturing for Electronics or Optoelectronics 91 / M. J. Kelly -- II NEW MATERIALS AND NEW PHYSICS 99 -- Surface Waves Everywhere 102 / M. I. Dyakonov -- Graphene and Atom-Thick Two-Dimensional Materials: Device Application Prospects 114 / S. Hwang, J. Heo, M.-H. Lee, K.-E. Byun, Y. Cho, and S. Park -- Computing with Coupled Relaxation Oscillators 131 / N. Shukla, A. Parihar, A. Raychowdhury, and S. Datta -- On the Field-Induced Insulator-Metal Transition in VO2 Films 140 / S. Luryi and B. Spivak -- Group IV Alloys for Advanced Nano- and Optoelectronic Applications 150 / D. GrŠutzmacher -- High-Sn Content GeSn Light Emitters for Silicon Photonics 162 / D. Stange, C. Schulte-Braucks, N. von den Driesch, S. Wirths, R. Geiger, T. Zabel, G. Mussler, S. Lenk, T. Stoica, J. M. Hartmann, H. Sigg, Z. Ikonic, S. Mantl, D. GrŠutzmacher, and D. Buca -- Gallium Nitride-Based Lateral and Vertical Nanowire Devices 174 / Y.-W. Jo, D.-H. Son, K.-S. Im, and J.-H. Lee -- Scribing Graphene Circuits 183 / N. Rodriguez, R. J. Ruiz, C. Marquez, and F. Gamiz -- Structure and Electron Transport in Irradiated Monolayer Graphene 193 -- I. Shlimak, A. V. Butenko, E. Zion, V. Richter, Yu. Kaganovskii, L. Wolfson, A. Sharoni, A. Haran, D. Naveh, E. Kogan, and M. Kaveh -- Interplay of Coulomb Blockade and Luttinger-Liquid Physics in Disordered One-Dimensional InAs Nanowires with Strong Spin Orbit Coupling 206 / R. Hevroni, V. Shelukhin, M. Karpovski, M. Goldstein, E. Sela, A. Palevski, and H. Shtrikman. | |
505 | 8 | _aIII MICROELECTRONICS IN HEALTH, ENERGY HARVESTING, AND COMMUNICATIONS 215 -- Image-Guided Intervention and Therapy: The First Time Right 218 / B. H. W. Hendriks, D. Mioni, W. Crooijmans, and H. van Houten -- Rewiring the Nervous System, Without Wires 231 / D. A. Borton -- Nano-Power Integrated Electronics for Energy Harvesting, Conversion and Management 245 / A. Romani, M. Dini, M. Filippi, M. Tartagni, and E. Sangiorgi -- Will Composite Nanomaterials Replace Piezoelectric Thin Films for Energy Transduction Applications 259 / R. Tao, G. Ardila, R. Hinchet, A. Michard, L. Mont�es, and M. Mouis -- New Generation of Vertical Cavity Surface Emitting Lasers for Optical Interconnects 273 / N. Ledentsov Jr., V. A. Shchukin, N. N. Ledentsov, J.-R. Kopp, S. Burger, and F. Schmidt -- Reconfigurable Infrared Photodetector Based on Asymmetrically Doped Double Quantum Wells for Multicolor and Remote Temperature Sensing 289 / X. Zhang, V. Mitin, G. Thomain, T. Yore, Y. Li, J. K. Choi, K. Sablon, and A. Sergeev -- Tunable Photonic Molecules for Spectral Engineering in Dense Photonic Integration 298 / M. C. M. M. Souza, G. F. M. Rezende, A. A. G. von Zuben, G. S. Wiederhecker, N. C. Frateschi, and L. A. M. Barea -- INDEX 307. | |
506 | 1 | _aRestricted to subscribers or individual electronic text purchasers. | |
520 | _aPresents the developments in microelectronic-related fields, with comprehensive insight from a number of leading industry professionals The book presents the future developments and innovations in the developing field of microelectronics. The book's chapters contain contributions from various authors, all of whom are leading industry professionals affiliated either with top universities, major semiconductor companies, or government laboratories, discussing the evolution of their profession. A wide range of microelectronic-related fields are examined, including solid-state electronics, material science, optoelectronics, bioelectronics, and renewable energies. The topics covered range from fundamental physical principles, materials and device technologies, and major new market opportunities. . Describes the expansion of the field into hot topics such as energy (photovoltaics) and medicine (bio-nanotechnology). Provides contributions from leading industry professionals in semiconductor micro- and nano-electronics. Discusses the importance of micro- and nano-electronics in today's rapidly changing and expanding information society Future Trends in Microelectronics: Journey into the Unknown is written for industry professionals and graduate students in engineering, physics, and nanotechnology. | ||
530 | _aAlso available in print. | ||
538 | _aMode of access: World Wide Web | ||
588 | _aDescription based on PDF viewed 01/18/2017. | ||
650 | 0 |
_aNanotechnology _vCongresses. |
|
650 | 0 |
_aMicroelectronics _vCongresses. |
|
655 | 0 | _aElectronic books. | |
695 | _aTime-domain analysis | ||
695 | _aTorque | ||
695 | _aTransducers | ||
695 | _aTunneling | ||
695 | _aTunneling magnetoresistance | ||
695 | _aTwo dimensional displays | ||
695 | _aVanadium | ||
695 | _aVertical cavity surface emitting lasers | ||
695 | _aVoltage control | ||
695 | _aVoltage measurement | ||
695 | _aWet etching | ||
695 | _aWireless communication | ||
695 | _aWireless sensor networks | ||
695 | _aWires | ||
695 | _aX-ray imaging | ||
695 | _aZinc oxide | ||
695 | _aApertures | ||
695 | _aCMOS technology | ||
695 | _aCapacitance | ||
695 | _aCapacitors | ||
695 | _aCatheters | ||
695 | _aCavity resonators | ||
695 | _aClocks | ||
695 | _aComputed tomography | ||
695 | _aConductivity | ||
695 | _aCouplings | ||
695 | _aCrystals | ||
695 | _aDark current | ||
695 | _aData communication | ||
695 | _aDetectors | ||
695 | _aDielectric constant | ||
695 | _aDielectrics | ||
695 | _aDispersion | ||
695 | _aElectric fields | ||
695 | _aElectrostatics | ||
695 | _aEnergy harvesting | ||
695 | _aFabrication | ||
695 | _aField effect transistors | ||
695 | _aFilms | ||
695 | _aFlip-flops | ||
695 | _aGallium | ||
695 | _aGallium arsenide | ||
695 | _aGallium nitride | ||
695 | _aGraphene | ||
695 | _aGravity | ||
695 | _aHEMTs | ||
695 | _aHeart | ||
695 | _aII-VI semiconductor materials | ||
695 | _aIntegrated circuit interconnections | ||
695 | _aIntegrated circuits | ||
695 | _aIntegrated optics | ||
695 | _aIons | ||
695 | _aLaser beams | ||
695 | _aLaser modes | ||
695 | _aLenses | ||
695 | _aLight emitting diodes | ||
695 | _aLithography | ||
695 | _aLogic gates | ||
695 | _aMOSFET | ||
695 | _aMagnetic anisotropy | ||
695 | _aMagnetic separation | ||
695 | _aMagnetic tunneling | ||
695 | _aMagnetization | ||
695 | _aMarket research | ||
695 | _aMechanical factors | ||
695 | _aMedical treatment | ||
695 | _aMetals | ||
695 | _aMicroelectronics | ||
695 | _aNanoscale devices | ||
695 | _aNanowires | ||
695 | _aNonvolatile memory | ||
695 | _aOptical coupling | ||
695 | _aOptical device fabrication | ||
695 | _aOptical filters | ||
695 | _aOptical imaging | ||
695 | _aOptical refraction | ||
695 | _aOptical resonators | ||
695 | _aOptical surface waves | ||
695 | _aOptical variables control | ||
695 | _aOptical waveguides | ||
695 | _aOrbits | ||
695 | _aOscillators | ||
695 | _aPerformance evaluation | ||
695 | _aPerpendicular magnetic anisotropy | ||
695 | _aPhotoconductivity | ||
695 | _aPhotonic band gap | ||
695 | _aPhotonics | ||
695 | _aPhysics | ||
695 | _aPiezoelectric materials | ||
695 | _aPlasmas | ||
695 | _aPower demand | ||
695 | _aProbes | ||
695 | _aProcess control | ||
695 | _aProduction | ||
695 | _aRadiation effects | ||
695 | _aRaman scattering | ||
695 | _aRandom access memory | ||
695 | _aReal-time systems | ||
695 | _aReliability | ||
695 | _aSea surface | ||
695 | _aSelf-assembly | ||
695 | _aSensors | ||
695 | _aShape | ||
695 | _aSilicon | ||
695 | _aSilicon photonics | ||
695 | _aSpinal cord | ||
695 | _aSplit gate flash memory cells | ||
695 | _aStrain | ||
695 | _aSubstrates | ||
695 | _aSurface acoustic waves | ||
695 | _aSurface treatment | ||
695 | _aSwitches | ||
695 | _aSwitching circuits | ||
695 | _aSynchronization | ||
695 | _aTemperature | ||
695 | _aTemperature dependence | ||
695 | _aTemperature measurement | ||
695 | _aTemperature sensors | ||
695 | _aThree-dimensional displays | ||
700 | 1 | _aLuryi, Serge. | |
700 | 1 | _aXu, Jimmy. | |
700 | 1 |
_aZaslavsky, Alex, _d1963- |
|
710 | 2 |
_aIEEE Xplore (Online Service), _edistributor. |
|
710 | 2 |
_aWiley, _epublisher. |
|
776 | 0 | 8 |
_iPrint version: _z9781119069119 |
856 | 4 | 2 |
_3Abstract with links to resource _uhttps://ieeexplore.ieee.org/xpl/bkabstractplus.jsp?bkn=7753056 |
999 |
_c40745 _d40745 |